Preferential Outward Diffusion of Cu during Unconventional Galvanic Replacement Reactions between HAuCl4 and Surface-Limited Cu Nanocrystals
Author:
Affiliation:
1. Optical Technology Division, Physics Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899-8443, United States
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn200565y
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5. X-ray microdiffraction study of Cu interconnects
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