Synthesis of Tantalum(V) Amido Silyl Complexes and the Unexpected Formation of (Me2N)3Ta(η2-ONMe2)[OSi(SiMe3)3] from the Reaction of (Me2N)4Ta[Si(SiMe3)3] with O2-Reference-Cited by-同舟云学术

Synthesis of Tantalum(V) Amido Silyl Complexes and the Unexpected Formation of (Me2N)3Ta(η2-ONMe2)[OSi(SiMe3)3] from the Reaction of (Me2N)4Ta[Si(SiMe3)3] with O2

Published:2002-08-21 Issue:19 Volume:21 Page:3973-3978
ISSN:0276-7333
Container-title:Organometallics
language:en
Short-container-title:Organometallics

Author:

Wu Zhongzhi¹,Cai Hu¹,Yu Xianghua¹,Blanton Jaime R.¹,Diminnie Jonathan B.¹,Pan Hong-Jun¹,Xue Ziling¹,Bryan Jeffrey C.²

Affiliation:

1. Department of Chemistry, The University of Tennessee, Knoxville, Tennessee 37996-1600

2. Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6181

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/om020537g

Reference45 articles.

1. Atmospheric Pressure Chemical Vapor Deposition of Titanium Nitride from Tetrakis (diethylamido) Titanium and Ammonia

2. Chemical vapour deposition of nitride thin films

3. Ultrathin Diffusion Barriers/Liners for Gigascale Copper Metallization

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