Preparation of Epoxy/Silica and Epoxy/Titania Hybrid Resists via a Sol−Gel Process for Nanoimprint Lithography-Reference-Cited by-同舟云学术

Preparation of Epoxy/Silica and Epoxy/Titania Hybrid Resists via a Sol−Gel Process for Nanoimprint Lithography

Published:2010-01-14 Issue:5 Volume:114 Page:2179-2183
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Wu Chun-Chang¹,Hsu Steve Lien-Chung¹

Affiliation:

1. Department of Materials Science & Engineering, Center for Micro/Nano Science and Technology, National Cheng-Kung University, Tainan, 701-01, Taiwan, Republic of China

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp908141f

Reference27 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Recent progress in nanoimprint technology and its applications

3. Nanoimprint Lithography: Methods and Material Requirements

4. Nanoimprint lithography: An old story in modern times? A review

5. Sub-10 nm imprint lithography and applications

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