Self-Assembled Biofilm of Hydrophobins Protects the Silicon Surface in the KOH Wet Etch Process-Reference-Cited by-同舟云学术

Self-Assembled Biofilm of Hydrophobins Protects the Silicon Surface in the KOH Wet Etch Process

Published:2007-06-20 Issue:15 Volume:23 Page:7920-7922
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

De Stefano Luca¹,Rea Ilaria¹,Armenante Annunziata¹,Giardina Paola¹,Giocondo Michele¹,Rendina Ivo¹

Affiliation:

1. Unit of Naples-Institute for Microelectronics and Microsystems, Via P. Castellino 111, 80131 Naples, Italy, Department of Physical Sciences and Department of Organic Chemistry and Biochemistry, University of Naples “Federico II”, Via Cinthia 4, 80126, Naples, Italy, and LYCRIL − INFM-CNR, Via P. Bucci, Cubo 33/B, 87036 Arcavacata di Rende, Cosenza, Italy

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la701189b

Reference7 articles.

1. Future lab-on-a-chip technologies for interrogating individual molecules

2. Hydrophobins: proteins with potential

3. Hydrophobins, the fungal coat unravelled

4. Self-Assembled Hydrophobin Protein Films at the Air−Water Interface: Structural Analysis and Molecular Engineering

5. Structural Characterization of the Hydrophobin SC3, as a Monomer and after Self-Assembly at Hydrophobic/Hydrophilic Interfaces

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