Large Area Extreme-UV Lithography of Graphene Oxide via Spatially Resolved Photoreduction
Author:
Affiliation:
1. Dipartimento di Fisica, Università dell’Aquila, Via Vetoio, 67100, L’Aquila, Italy
2. Dipartimento di Fisica, Università dell’Aquila, g.c. LNGS-INFN, 67100, L’Aquila, Italy
3. CNR-ISOF, Via Gobetti 101, 40129 Bologna, Italy
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la204637a
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