Immersion Deposition of Metal Films on Silicon and Germanium Substrates in Supercritical Carbon Dioxide-Reference-Cited by-同舟云学术

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Immersion Deposition of Metal Films on Silicon and Germanium Substrates in Supercritical Carbon Dioxide

Published:2002-11-16 Issue:1 Volume:15 Page:83-91
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Ye Xiang R.,Wai Chien M.,Zhang Daqing,Kranov Yanko,McIlroy David N.,Lin Yuehe,Engelhard Mark

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm011534h

Reference84 articles.

1. Mechanism of the Chemical Deposition of Nickel on Silicon Wafers in Aqueous Solution

2. Selective electroless Ni deposition onto Pd-activated Si for integrated circuit fabrication

3. Copper electroless deposition technology for ultra-large-scale-integration (ULSI) metallization

4. Electroless Copper Deposition Using Glyoxylic Acid as Reducing Agent for Ultralarge Scale Integration Metallization

5. Electrodeposition of Soft Gold from a Thiosulfate‐Sulfite Bath for Electronics Applications

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1. Embedding platinum-based nanoparticles within ordered mesoporous carbon using supercritical carbon dioxide technique as a highly efficient oxygen reduction electrocatalyst;Journal of Alloys and Compounds;2018-04

2. Hydrofluoric Acid-Free Electroless Deposition of Metals on Silicon in Ionic Liquids and Its Enhanced Performance in Lithium Storage;ACS Applied Materials & Interfaces;2017-03-24

3. Supercritical Fluid Extraction of Metal Chelate: A Review;Critical Reviews in Analytical Chemistry;2016-08-22

4. Supercritical carbon dioxide etching of transition metal (Cu, Ni, Co, Fe) thin films;Microelectronic Engineering;2016-03

5. Pd-on-Si catalysts prepared via galvanic displacement for the selective hydrogenation of para-chloronitrobenzene;Chemical Communications;2016

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