Solvent Dependence of the Morphology of Spin-Coated Thin Films of Polydimethylsiloxane-Rich Polystyrene-block-Polydimethylsiloxane Copolymers
Author:
Affiliation:
1. Department of Polymer Engineering, The University of Akron, Akron, Ohio 44325-0301, United States
2. Department of Polymer Science, The University of Akron, Akron, Ohio 44325-3909, United States
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma300044d
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1. Lithography with a mask of block copolymer microstructures
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