Advances in Quantum Dot Direct Photolithographic Patterning-Reference-Cited by-同舟云学术

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Advances in Quantum Dot Direct Photolithographic Patterning

Published:2024-06-21 Issue:7 Volume:6 Page:3176-3189
ISSN:2639-4979
Container-title:ACS Materials Letters
language:en
Short-container-title:ACS Materials Lett.

Author:

Qiu Yanyan¹,Yu Yixin¹,Wang Shanshan¹,Chen Menglu¹²³^ORCID

Affiliation:

1. School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

2. Laboratory of Science and Technology on Integrated Logistics Support, National University of Defense Technology, Changsha 410073, China

3. Westlake Institute for Optoelectronics, Fuyang, Hangzhou 311421, China

Funder

National Natural Science Foundation of China

Beijing National Laboratory for Condensed Matter Physics

Westlake Institute for Optoelectronics

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsmaterialslett.4c00762

Reference59 articles.

1. Prospects of Colloidal Nanocrystals for Electronic and Optoelectronic Applications

2. Semiconductor Nanocrystals: Structure, Properties, and Band Gap Engineering

3. Prospects of Nanoscience with Nanocrystals

4. Erratum: The surface science of nanocrystals

5. Nanocrystal Quantum Dots: From Discovery to Modern Development

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