A Ru(II) η3-Allylic Complex as a Novel Precursor for the CVD of Ru- and RuO2-Nanostructured Thin Films-Reference-Cited by-同舟云学术

A Ru(II) η3-Allylic Complex as a Novel Precursor for the CVD of Ru- and RuO2-Nanostructured Thin Films

Published:1999-06-01 Issue:13 Volume:15 Page:4537-4543
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Barreca D.¹,Buchberger A.¹,Daolio S.¹,Depero L. E.¹,Fabrizio M.¹,Morandini F.¹,Rizzi G. A.¹,Sangaletti L.¹,Tondello E.¹

Affiliation:

1. CSSRCC-CNR, Dipart. CIMA, Università di Padova, Via Marzolo 1, I-35131 Padova, Italy INFM and Dipart. di Chimica e Fisica per l’Ingegneria e per i Materiali, Università di Brescia, Via Branze 38, I-25123 Brescia, Italy and IPELP CNR, Corso Stati Uniti 4, I-35020 Padova, Italy

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la981779h

Reference57 articles.

1. Catalytic and structural properties of ruthenium bimetallic catalysts: effects of pretreatment on the behaviour of various RuAl2O3 catalysts in alkane hydrogenolysis

2. Optimization of the Volumetric Hydrogen Chemisorption Technique for Dispersions of Ru/SiO2 Catalysts

3. Catalytic and structural properties of ruthenium monometallic and bimetallic catalysts: characterization by EXAFS and XRD

4. Ruthenium surface compounds supported on silica gel I. Preparation and catalytic properties

5. Ferromagnetism of Imperfect Ultrathin Ru and Rh Films on a Ag(001) Substrate

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermodynamic Characterization of Ruthenium β-Diketonate Complex Ru(thd)3 as a Precursor for the CVD Preparation of Coatings;Russian Journal of Inorganic Chemistry;2020-05

2. Carbon encapsulated RuO2 nano-dots anchoring on graphene as an electrode for asymmetric supercapacitors with ultralong cycle life in an ionic liquid electrolyte;Journal of Materials Chemistry A;2016

3. Chemical vapour-phase deposition of ruthenium-containing thin films;Russian Chemical Reviews;2014-08-29

4. Ruthenium complexes as precursors for chemical vapor-deposition (CVD);RSC Adv.;2014

5. Metallic Materials Deposition: Metal-Organic PrecursorsBased in part on the article Metallic Materials Deposition: Metal-Organic Precursors by Herbert D. Kaesz, Alfred Zinn, & Lutz Brandt which appeared in theEncyclopedia of Inorganic Chemistry, First Edition.;Encyclopedia of Inorganic and Bioinorganic Chemistry;2011-12-15