Chemical Vapor Deposition of N-Doped Graphene and Carbon Films: The Role of Precursors and Gas Phase
Author:
Affiliation:
1. Synthetic Chemistry, Max-Planck-Institute for Polymer Research, Ackermannweg 10, 55128 Mainz, Germany
2. Institut für Physik & IRIS Adlershof, Humboldt-Universität zu Berlin, Brook-Taylor-Straße 6, 12489 Berlin, Germany
Funder
European Commission
European Research Council
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn405661b
Reference39 articles.
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