Electroless Nickel-Plated UV-Embossed Microstructured Surface with Very High Aspect Ratio Channels-Reference-Cited by-同舟云学术

Electroless Nickel-Plated UV-Embossed Microstructured Surface with Very High Aspect Ratio Channels

Published:2004-01-17 Issue:4 Volume:20 Page:1031-1035
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Yan Yehai¹,Chan-Park Mary B.¹,Gao Jianxia¹,Yue C. Y.¹

Affiliation:

1. The Biological and Chemical Processing Laboratory, School of Mechanical and Production Engineering, and The Singapore−MIT Alliance, Innovation in Manufacturing Systems and Technology Program, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la035454z

Reference18 articles.

1. Polymer microfabrication methods for microfluidic analytical applications

2. Fundamentals of Microfabrication

3. High aspect ratio silicon trench fabrication by inductively coupled plasma

4. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS

5. High Density Array Matrices of Polymeric Structures by Ultrathin Interfacial Layer-Mediated Double Replication Approach

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