Optimization of a Solution-Processed TiO<sub><i>x</i></sub>/(n)c-Si Electron-Selective Interface by Pre- and Postdeposition Treatments-Reference-Cited by-同舟云学术

Optimization of a Solution-Processed TiO_x/(n)c-Si Electron-Selective Interface by Pre- and Postdeposition Treatments

Published:2024-03-19 Issue:13 Volume:16 Page:16950-16961
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Beyraghi Naser¹²^ORCID,Sahiner Mehmet C.¹³^ORCID,Oguz Oguzhan¹,Yerci Selcuk¹²³^ORCID

Affiliation:

1. ODTU-GUNAM, Middle East Technical University, Ankara 06800, Turkey

2. Department of Micro and Nanotechnology, Middle East Technical University, Ankara 06800, Turkey

3. Department of Electrical and Electronics Engineering, Middle East Technical University, Ankara 06800, Turkey

Funder

Newton Fund

T?rkiye Bilimsel ve Teknolojik Arastirma Kurumu

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c18134

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4. Exceeding conversion efficiency of 26% by heterojunction interdigitated back contact solar cell with thin film Si technology

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