Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films-Reference-Cited by-同舟云学术

Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films

Published:2023-06-15 Issue:25 Volume:15 Page:30935-30943
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Nowik-Boltyk Ewa Malgorzata¹^ORCID,Junghoefer Tobias¹,Glaser Mathias¹,Giangrisostomi Erika²,Ovsyannikov Ruslan²,Zhang Shuyang³,Shu Chan³,Rajca Andrzej³^ORCID,Calzolari Arrigo⁴^ORCID,Casu M. Benedetta¹^ORCID

Affiliation:

1. Institute of Physical and Theoretical Chemistry, University of Tübingen, 72076 Tübingen, Germany

2. Institute Methods and Instrumentation for Synchrotron Radiation Research, Helmholtz-Zentrum Berlin, 12489 Berlin, Germany

3. Department of Chemistry, University of Nebraska, Lincoln, Nebraska 68588, United States

4. CNR-NANO Istituto Nanoscienze, Centro S3, 41125 Modena, Italy

Funder

Helmholtz-Zentrum Berlin f?r Materialien und Energie

Deutsche Forschungsgemeinschaft

Horizon 2020 Framework Programme

National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c02057

Reference57 articles.

1. Nanoscale Studies of Organic Radicals: Surface, Interface, and Spinterface

2. Magnetic behavior in metal-free radical thin films

3. Molecular Nanomagnets

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