Self-Diffusion versus Intentional Doping: Beneficial and Damaging Impact on Hematite Photoanode Interfaces-Reference-Cited by-同舟云学术

Self-Diffusion versus Intentional Doping: Beneficial and Damaging Impact on Hematite Photoanode Interfaces

Published:2023-11-09 Issue:47 Volume:15 Page:55030-55042
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Daminelli Lara M.¹²,Rodríguez-Gutierrez Ingrid¹,Pires Fabio A.¹³^ORCID,dos Santos Gabriel T.¹⁴^ORCID,Bettini Jefferson¹,Souza Flavio L.¹²³^ORCID

Affiliation:

1. Brazilian Nanotechnology National Laboratory (LNNano), Brazilian Center for Research in Energy and Materials (CNPEM), Campinas, Sao PauloCEP 13083-100, Brazil

2. Humanities and Nature Science Center (CCNH), Federal University of ABC (UFABC), Santo André, Sao PauloCEP 09210-580, Brazil

3. Institute of Chemistry, University of Campinas (UNICAMP), PO Box 6154, Campinas, Sao PauloCEP 13083-970, Brazil

4. Engineering School, Federal University of Rio Grande do Sul, Porto Alegre, Rio Grande do Sul 90010-150, Brazil

Funder

Conselho Nacional de Desenvolvimento Cient?fico e Tecnol?gico

Ag?ncia Nacional do Petr?leo, G?s Natural e Biocombust?veis

Funda??o de Amparo ? Pesquisa do Estado de S?o Paulo

Shell

Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c10516

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