Time-Resolved Synchrotron XPS Monitoring of Irradiation-Induced Nitrobenzene Reduction for Chemical Lithography-Reference-Cited by-同舟云学术

Time-Resolved Synchrotron XPS Monitoring of Irradiation-Induced Nitrobenzene Reduction for Chemical Lithography

Published:2007-06-08 Issue:26 Volume:111 Page:7541-7549
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Roodenko K.¹,Gensch M.¹,Rappich J.¹,Hinrichs K.¹,Esser N.¹,Hunger R.¹

Affiliation:

1. Institute for Analytical Sciences, Department Berlin, Albert-Einstein-Strasse 9, 12489 Berlin, Germany, Deutsches Elektronen-Synchrotron, Notkestrasse 85, 22607 Hamburg, Germany, Hahn-Meitner-Institut Berlin GmbH, Abteilung Silizium-Photovoltaik, Kekuléstrasse 5, 12489 Berlin, Germany, and Institute of Material Science, TU Darmstadt, Petersenstrasse 23, 64287 Darmstadt, Germany

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp072440j

Reference51 articles.

1. In-Situ Source-Template-Interface Reaction Route to Semiconductor CdS Submicrometer Hollow Spheres

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