Deposition of Monolayers by Retraction from Solution: Ellipsometric Study of Cetyltrimethylammonium Bromide Adsorption at Silica−Air and Silica−Water Interfaces-Reference-Cited by-同舟云学术

Deposition of Monolayers by Retraction from Solution: Ellipsometric Study of Cetyltrimethylammonium Bromide Adsorption at Silica−Air and Silica−Water Interfaces

Published:1998-04-01 Issue:9 Volume:14 Page:2444-2450
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Eskilsson K.¹,Yaminsky V. V.¹

Affiliation:

1. Physical Chemistry 1, Center for Chemistry and Chemical Engineering, Lund University, Box 124, 22100 Lund, Sweden

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la971066j

Reference22 articles.

1. Molecular mechanisms and kinetics during the self-assembly of surfactant layers

2. Thermodynamic Analysis of Solute Effects on Contact Angles. Equilibrium Adsorption of Cationic Surfactants at Silica-Vapor and Silica-Water Interfaces

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