13C MAS NMR Study of Poly(methacrylic acid)–Polyether Complexes and Multilayers
Author:
Affiliation:
1. Centre for Self-Assembled Chemical Structures (CSACS-CRMAA), Department of Chemistry, McGill University, 801 Sherbrooke St. W., Montreal, QC H3A 0B8, Canada
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma401673n
Reference37 articles.
1. Electrochemically enabled polyelectrolyte multilayer devices: from fuel cells to sensors
2. ten Brinke, G.; Ruokolainen, J.; Ikkala, O.; Binder, W., Eds.Springer:Berlin, 2007; Vol.207, p113.
3. 1H Solid State NMR Study of Poly(methacrylic acid) Hydrogen-Bonded Complexes
4. Layered, Erasable Polymer Multilayers Formed by Hydrogen-Bonded Sequential Self-Assembly
5. Layer-by-Layer Hydrogen-Bonded Polymer Films: From Fundamentals to Applications
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Composition Fluctuation of Reversible Interlocked Polymer Networks on Microscale: Inhomogeneity in Homogeneity;Macromolecules;2023-09-05
2. Preparation and properties of stable nano interpoymer complex from polycation and polyanion with high density of charge by direct mixing;Journal of Polymer Research;2022-03-25
3. Application of SSNMR to Selected Classes of Systems;Solid State NMR;2021-07-09
4. Heterogeneous Dynamics and Microdomain Structure of High-Performance Chitosan Film as Revealed by Solid-State NMR;The Journal of Physical Chemistry C;2021-06-10
5. Mechanism of Enhanced Nifedipine Dissolution by Polymer-Blended Solid Dispersion through Molecular-Level Characterization;Molecular Pharmaceutics;2018-07-31
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3