Systematic Study on the Effect of Solvent Removal Rate on the Morphology of Solvent Vapor Annealed ABA Triblock Copolymer Thin Films
Author:
Affiliation:
1. Chemical Engineering Department, University of Delaware, Newark, Delaware 19716, United States
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn203776c
Reference42 articles.
1. Nanofabrication of Double-Gyroid Thin Films
2. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
3. A Simple Route to Highly Oriented and Ordered Nanoporous Block Copolymer Templates
4. Nanoscopic Templates from Oriented Block Copolymer Films
5. Templating Nanoporous Polymers with Ordered Block Copolymers
Cited by 123 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Tough polycyclooctene nanoporous membranes from etchable block copolymers;Soft Matter;2024
2. Tailoring surface and bulk morphologies to control transport properties of sulfonated block copolymer films;Polymer;2023-12
3. Horizontal to perpendicular transition of lamellar and cylinder phases in block copolymer films induced by interface segregation of single-chain nanoparticles during solvent evaporation;The Journal of Chemical Physics;2023-09-22
4. Recent progress in non-photolithographic patterning of polymer thin films;Progress in Polymer Science;2023-07
5. Controlled Orientation of Silicon-Containing Diblock Copolymer Thin Films by Substrate Functionalization Under Vacuum;Macromolecules;2023-01-16
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3