Correlation among Structure, Microstructure, and Electrochemical Properties of NiAl–CO3 Layered Double Hydroxide Thin Films-Reference-Cited by-同舟云学术

Correlation among Structure, Microstructure, and Electrochemical Properties of NiAl–CO3 Layered Double Hydroxide Thin Films

Author:

Faour A.¹,Mousty C.¹,Prevot V.¹,Devouard B.²³,De Roy A.¹,Bordet P.⁴,Elkaim E.⁵,Taviot-Gueho C.¹

Affiliation:

1. ICCF, UMR 6296, Centre National de la Recherche Scientifique (CNRS), BP 80026, F-63171 Aubiere, France

2. LMV, UMR 6524, CNRS, F-63038 Clermont-Ferrand, France

3. LMV, R 163, Institut de Recherche pour le Développement (IRD), F-63038 Clermont-Ferrand, France

4. Institut Néel, CNRS, Université Joseph Fourier, BP 166, F-38042 Grenoble Cedex 9, France

5. Synchrotron SOLEIL, F- 91192 Gif-sur-Yvette Cedex, France

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

Reference53 articles.

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