Photoassisted Immersion Deposition of Cu Clusters onto Porous Silicon: A Langmuir–Hill Ligand–Locus Model Applied to the Growth Kinetics-Reference-Cited by-同舟云学术

Photoassisted Immersion Deposition of Cu Clusters onto Porous Silicon: A Langmuir–Hill Ligand–Locus Model Applied to the Growth Kinetics

Author:

Recio Gonzalo¹²,Gallach Dario¹,Manso Silván Miguel¹,Fukami Kazuhiro³,Martín Palma Raúl José¹,Castro Germán Rafael⁴⁵,Muñoz-Noval Álvaro¹⁴⁵

Affiliation:

1. Departamento de Física Aplicada, Universidad Autonoma de Madrid, Madrid 28049, Spain

2. Departamento de Ciencias Matemáticas y Física, Universidad Católica de Temuco, 48-13302, Temuco, Chile

3. Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan

4. Instituto de Ciencia de Materiales de Madrid, CSIC, Madrid 28049, Spain

5. Spanish CRG, European Sinchrotron Radiation Facility, Grenoble 38000, France

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

Reference46 articles.

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