Metabolomic Analysis of the Effects of Chronic Arsenic Exposure in a Mouse Model of Diet-Induced Fatty Liver Disease
Author:
Affiliation:
1. Biostatistics Core, Karmanos Cancer Institute, Wayne State University School of Medicine, Detroit, Michigan 48201, United States
2. Robley Rex VAMC, Louisville, Kentucky 40292, United States
Publisher
American Chemical Society (ACS)
Subject
General Chemistry,Biochemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/pr400719u
Reference41 articles.
1. Steatohepatitis: A tale of two “hits”?
2. Evolution of inflammation in nonalcoholic fatty liver disease: The multiple parallel hits hypothesis
3. Nonalcoholic fatty liver disease: predisposing factors and the role of nutrition☆
4. Toxicant-associated Steatohepatitis
5. Chronic subhepatotoxic exposure to arsenic enhances hepatic injury caused by high fat diet in mice
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