Controlled Formation of Silica Structures Using Siloxane/Block Copolymer Complexes Prepared in Various Solvent Mixtures
Author:
Affiliation:
1. National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
2. CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la403168v
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1. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
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3. Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order
4. Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
5. Unifying Weak- and Strong-Segregation Block Copolymer Theories
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