Temperature-Controlled Depth Profiling of Poly(methyl methacrylate) Using Cluster Secondary Ion Mass Spectrometry. 2. Investigation of Sputter-Induced Topography, Chemical Damage, and Depolymerization Effects-Reference-Cited by-同舟云学术

Temperature-Controlled Depth Profiling of Poly(methyl methacrylate) Using Cluster Secondary Ion Mass Spectrometry. 2. Investigation of Sputter-Induced Topography, Chemical Damage, and Depolymerization Effects

Published:2006-12-22 Issue:3 Volume:79 Page:837-845
ISSN:0003-2700
Container-title:Analytical Chemistry
language:en
Short-container-title:Anal. Chem.

Author:

Mahoney Christine M.¹,Fahey Albert J.¹,Gillen Greg¹,Xu Chang¹,Batteas James D.¹

Affiliation:

1. National Institute of Standards and Technology, 100 Bureau Drive, Mail Stop 8371, Gaithersburg, Maryland 20899-8371

Publisher

American Chemical Society (ACS)

Subject

Analytical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ac061357%2B

Reference21 articles.

1. Preliminary evaluation of an SF5+ polyatomic primary ion beam for analysis of organic thin films by secondary ion mass spectrometry

2. Depth Profiling of 4-Acetamindophenol-Doped Poly(lactic acid) Films Using Cluster Secondary Ion Mass Spectrometry

3. Depth Profiling of Poly(l-lactic acid)/Triblock Copolymer Blends with Time-of-Flight Secondary Ion Mass Spectrometry

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