Heteroleptic Tin(IV) Aminoalkoxides and Aminofluoroalkoxides as MOCVD Precursors for Undoped and F-Doped SnO2 Thin Films-Reference-Cited by-同舟云学术

Heteroleptic Tin(IV) Aminoalkoxides and Aminofluoroalkoxides as MOCVD Precursors for Undoped and F-Doped SnO2 Thin Films

Published:2020-04-27 Issue:10 Volume:59 Page:7167-7180
ISSN:0020-1669
Container-title:Inorganic Chemistry
language:en
Short-container-title:Inorg. Chem.

Author:

Verchère Alexandre¹,Mishra Shashank¹^ORCID,Jeanneau Erwann²,Guillon Hervé³,Decams Jean-Manuel³,Daniele Stéphane⁴

Affiliation:

1. Université Claude Bernard Lyon 1, CNRS, UMR 5256, Institut de Recherches sur la Catalyse et l’Environnement de Lyon (IRCELYON), 2 avenue Albert Einstein, 69626 Villeurbanne, France

2. Université Claude Bernard Lyon 1, Centre de Diffractométrie Henri Longchambon, 5 rue de La Doua, 69100 Villeurbanne, France

3. ANNEALSYS, 139 rue des Walkyries, 34000 Montpellier, France

4. Université Claude Bernard Lyon 1, C2P2, CPE Lyon - CNRS, UMR 5265, 43 Bvd du 11 Novembre 1918, 69616 Villeurbanne, France

Funder

Agence Nationale de la Recherche

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.inorgchem.0c00617

Reference80 articles.

1. The Race To Replace Tin-Doped Indium Oxide: Which Material Will Win?

2. Past achievements and future challenges in the development of optically transparent electrodes

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4. SnO2: A comprehensive review on structures and gas sensors

5. SnO2-Based Nanomaterials: Synthesis and Application in Lithium-Ion Batteries

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