Effect of Residual Stress on the Photochemical Properties of TiO2 Thin Films-Reference-Cited by-同舟云学术

Effect of Residual Stress on the Photochemical Properties of TiO2 Thin Films

Published:2009-06-18 Issue:29 Volume:113 Page:12811-12817
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Shibata Tatsuo¹,Irie Hiroshi¹,Tryk Donald A.¹,Hashimoto Kazuhito¹

Affiliation:

1. Department of Applied Chemistry, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan, Clean Energy Research Center, University of Yamanashi, 4-3-11 Takeda, Kofu, Yamanashi 400-8511, Japan, Fuel Cell Nanomaterials Center, University of Yamanashi, 4-3-11 Takeda, Kofu, Yamanashi 400-8511, Japan, and Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp904037t

Reference61 articles.

1. Chemistry and Applications of Photocatalytic Oxidation of Thin Organic Films

2. Photocatalysis on TiO2 Surfaces: Principles, Mechanisms, and Selected Results

3. The gas-phase photocatalytic mineralization of benzene on porous titania-based catalysts

4. Photooxidative self-cleaning transparent titanium dioxide films on glass

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