Atomic Layer Deposition of a High-Density Aminopropylsiloxane Network on Silica through Sequential Reactions of γ-Aminopropyltrialkoxysilanes and Water-Reference-Cited by-同舟云学术

Atomic Layer Deposition of a High-Density Aminopropylsiloxane Network on Silica through Sequential Reactions of γ-Aminopropyltrialkoxysilanes and Water

Published:2003-11-06 Issue:25 Volume:19 Page:10601-10609
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Ek Satu¹,Iiskola Eero I.¹,Niinistö Lauri¹,Vaittinen Jari¹,Pakkanen Tuula T.¹,Keränen Jetta¹,Auroux Aline¹

Affiliation:

1. Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O. Box 6100, FIN-02015 Espoo, Finland, Department of Chemistry, University of Joensuu, P.O. Box 111, FIN-80101 Joensuu, Finland, and Institut de Recherches sur la Catalyse − UPR (CNRS) 5401, 2 Avenue A. Einstein, F-69626 Villeurbanne Cedex, France

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la035472g

Reference43 articles.

1. Preface

2. Silane Coupling Agents

3. Aminopropylsilane treatment for the surface of porous glasses suitable for enzyme immobilisation

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