UV Photodesorption of Novel Molecular Beam Induced NO Layers on NiO(111)/Ni(111)-Reference-Cited by-同舟云学术

UV Photodesorption of Novel Molecular Beam Induced NO Layers on NiO(111)/Ni(111)

Published:2008-03-27 Issue:15 Volume:112 Page:5961-5965
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Zion B. D.¹,Sibener S. J.¹

Affiliation:

1. The James Franck Institute and Department of Chemistry, The University of Chicago, Gordon Center for Integrative Science, 929 East 57th Street, Chicago, Illinois 60637

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp711629s

Reference26 articles.

1. Kunz, A. B.J. Phys. C: Solid State Phys.1981,14, L455−L460.

2. Hugel, J.; Carabatos, C.J. Phys. C: Solid State Phys.1983,16, 6713−6721.

3. Hugel, J.; Carabatos, C.J. Phys. C: Solid State Phys.1983,16, 6723−6730.

4. Molecular beam induced changes in adsorption behavior of NO on NiO(111)∕Ni(111)

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