Enhanced Coverage and Sensitivity of Imprint DESI Mass Spectrometry Imaging for Plant Leaf Metabolites by Post-photoionization
Author:
Affiliation:
1. National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China
2. Center of Technology, China Tobacco Anhui Industrial Co, Ltd., Hefei 230088, Anhui, P. R. China
Funder
Central University Basic Research Fund of China
National Natural Science Foundation of China
CAS Interdisciplinary Innovation Team
CAS Key Technology Talent Program
Publisher
American Chemical Society (ACS)
Subject
Analytical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.analchem.2c03329
Reference60 articles.
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5. Infrared Laser Ablation Atmospheric Pressure Photoionization Mass Spectrometry
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