Traversing the “Top-Down/Bottom-Up” Divide: Molecular-Scale Lithography of Self-Assembled Ribbons-Reference-Cited by-同舟云学术

Traversing the “Top-Down/Bottom-Up” Divide: Molecular-Scale Lithography of Self-Assembled Ribbons

Published:2008-12-19 Issue:2 Volume:131 Page:398-399
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Jarvholm Jonas¹,Srinivasarao Mohan¹,Tolbert Laren M.¹

Affiliation:

1. School of Chemistry and Biochemistry and School of Polymer, Textile, and Fiber Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0400

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja805319k

Reference29 articles.

1. Understanding Moore's Law—Four Decades of Innovation (David C. Brock, ed.)

2. Immersion lithography: New opportunities for semiconductor manufacturing

3. Improved step and flash imprint lithography templates for nanofabrication

4. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

5. Molecular Lithography with DNA Nanostructures

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