A New Negative-Type Photosensitive Polyimide Based on Poly(hydroxyimide), a Cross-Linker, and a Photoacid Generator
Author:
Affiliation:
1. Department of Materials Science and Engineering, Faculty of Engineering, Yamagata University, Yonezawa, Yamagata 992, Japan
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma9605560
Reference15 articles.
1. New Photosensitive High Temperature Polymers for Electronic Applications
2. High‐Temperature‐Post‐Exposure Bake Process (HIT‐PEB) for Base‐Developable Polyimides Consisting of Diazonaphthoquinones and Polyamic Acids
3. A new positive-type photoreactive polyimide precursor using 1,4-dihydropyridine derivative
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