Structure and Chemical Characterization at the Atomic Level of Reactions in Al/CuO Multilayers-Reference-Cited by-同舟云学术

Structure and Chemical Characterization at the Atomic Level of Reactions in Al/CuO Multilayers

Published:2018-04-02 Issue:4 Volume:1 Page:1762-1770
ISSN:2574-0962
Container-title:ACS Applied Energy Materials
language:en
Short-container-title:ACS Appl. Energy Mater.

Author:

Abdallah Iman¹,Zapata James¹,Lahiner Guillaume¹,Warot-Fonrose Benedicte²,Cure Jeremy¹,Chabal Yves³^ORCID,Esteve Alain¹,Rossi Carole¹^ORCID

Affiliation:

1. LAAS-CNRS, University of Toulouse, 7 Avenue du colonel Roche, 31077 Toulouse, France

2. CEMES-CNRS, University of Toulouse, 29 rue Jeanne Marvig, 31055 Toulouse, France

3. Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, Texas 75080, United States

Funder

Agence Nationale de la Recherche

Universit? de Toulouse

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Materials Chemistry,Electrochemistry,Energy Engineering and Power Technology,Chemical Engineering (miscellaneous)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsaem.8b00296

Reference28 articles.

1. Time-Resolved Mass Spectrometry of the Exothermic Reaction between Nanoaluminum and Metal Oxides: The Role of Oxygen Release

2. Reactive multilayers fabricated by vapor deposition: A critical review

3. Gas Suppression via Copper Interlayers in Magnetron Sputtered Al–Cu2O Multilayers

4. Self-organized formation of nano-multilayer structure in the carbon-copper thin film during reactive magnetron sputtering deposition process

5. Multilayered Al/CuO thermite formation by reactive magnetron sputtering: Nano versus micro

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