Integration of Atomically Dispersed Cu–N4 Sites with C3N4 for Enhanced Photo-Fenton Degradation over a Nonradical Mechanism-Reference-Cited by-同舟云学术

Integration of Atomically Dispersed Cu–N₄ Sites with C₃N₄ for Enhanced Photo-Fenton Degradation over a Nonradical Mechanism

Published:2022-12-05 Issue:2 Volume:3 Page:150-164
ISSN:2690-0645
Container-title:ACS ES&T Engineering
language:en
Short-container-title:ACS EST Eng.

Author:

Dong Shuqian¹²,Chen Xu²,Su Linfeng²,Wen Yingjie²,Wang Yuechu²,Yang Qihao²,Yi Li²,Xu Wenwen²,Yang Qiu³,He Peilei²,Zhu Yunqing¹,Lu Zhiyi²⁴^ORCID

Affiliation:

1. School of Environmental Science and Engineering, Shaanxi University of Science and Technology, Xian710021, P. R. China

2. Key Laboratory of Advanced Fuel Cells and Electrolyzers Technology of Zhejiang Province, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang315201, P. R. China

3. Ningbo New Material Testing and Evaluation Center Co., Ltd, Ningbo New Materials Innovation Center, Ningbo, Zhejiang315201, P. R. China

4. University of Chinese Academy of Sciences, 100049Beijing, P. R. China

Funder

Ningbo Municipal Bureau of Science and Technology

National Natural Science Foundation of China

Chinese Academy of Sciences

Ningbo Yongjiang Talent Introduction Programme

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsestengg.2c00261

Reference71 articles.

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