Carburization of Tungsten Filaments in a Hot-Wire Chemical Vapor Deposition Process using 1,1,3,3-Tetramethyl-1,3-disilacyclobutane
Author:
Affiliation:
1. Department of Chemistry, University of Calgary, Calgary, Alberta T2N 1N4, Canada
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am900329q
Reference33 articles.
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3. Proceedings of the 4th International Conference on Hot-wire CVD (Cat-CVD) Processes.Thin Solid Films 2008, 516 (5).
4. The aging of tungsten filaments and its effect on wire surface kinetics in hot-wire chemical vapor deposition
5. The influence of different catalyzers in hot-wire CVD for the deposition of polycrystalline silicon thin films
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