Chlorosilane Production from Chlorine-Exposed Si(111) 7 × 7 and Cu/Si(111) Surfaces-Reference-Cited by-同舟云学术

Chlorosilane Production from Chlorine-Exposed Si(111) 7 × 7 and Cu/Si(111) Surfaces

Published:2002-02-01 Issue:8 Volume:106 Page:2018-2025
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Sysoev S. E.¹,Potapenko D. V.¹,Ermakov A. V.¹,Hinch B. J.¹,Strongin D. R.¹,Wright A. P.¹,Kuivila C.¹

Affiliation:

1. The Laboratory for Surface Modification and Department of Chemistry and Chemical Biology, Rutgers University, Piscataway, New Jersey 08854, Department of Chemistry, Temple University, Philadelphia, Pennsylvania 19122, Dow Corning Corporation, Midland, Michigan 48686, and Dow Corning Corporation, Carrollton, Kentucky 41008

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp013438%2B

Reference35 articles.

1. The Direct Synthesis of Organosilicon Compounds

2. Effect of Silicon Oxide Thickness on theDirect Synthesis of Dimethyldichlorosilane

3. Cl2 surface chemistry on Cu/Si(100): an ISS, XPS, and TPD study

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