Dynamic Observation of Reaction Processes of Pd with Si on a Si(111) 7 × 7 Surface after Thermal Treatment Using UHV−STM-Reference-Cited by-同舟云学术

Dynamic Observation of Reaction Processes of Pd with Si on a Si(111) 7 × 7 Surface after Thermal Treatment Using UHV−STM

Published:1999-08-19 Issue:20 Volume:15 Page:6813-6820
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Yoshida Shozo¹,Itoh Masanobu¹,Yamamoto Naoichi¹,Nagamura Toshihiko¹,Oyama Munetaka¹,Okazaki Satoshi¹

Affiliation:

1. Department of Material Chemistry, Graduate School of Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan, Department of Environmental Conservation and Development, Graduate School of Human and Environmental Studies, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan, and Unisoku Co. Ltd., 2-4-3 Kasugano, Hirakata 573-0131, Japan

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la981572o

Reference14 articles.

1. LEED investigations on the interaction of Pd and Ni with different Si(111) surfaces

2. Transmission electron microscopy and X-ray diffraction investigation of phase formation and transition between Pd2Si and PdSi in Pd thin films on (111)Si

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