Subsurface Oxidation for Micropatterning Silicon (SOMS)-Reference-Cited by-同舟云学术

Subsurface Oxidation for Micropatterning Silicon (SOMS)

Published:2009-01-09 Issue:3 Volume:25 Page:1289-1291
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Zhang Feng¹,Sautter Ken¹,Davis Robert C.¹,Linford Matthew R.¹

Affiliation:

1. Departments of Chemistry & Biochemistry and Physics & Astronomy, Brigham Young University, Provo Utah, and Yield Engineering Systems, Livermore, California

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la803408x

Reference21 articles.

1. Preparation of Silica-on-Titania Patterns with a Wettability Contrast

2. Developments of Plasma Etching Technology for Fabricating Semiconductor Devices

3. Direct pattern etching for micromachining applications without the use of a resist mask

4. Dry etching of porous silicon in high density plasmas

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