Microstructural Characterization and Electrochemical Properties of RuO2 Thin Film Electrodes Prepared by Reactive Radio-Frequency Magnetron Sputtering-Reference-Cited by-同舟云学术

Microstructural Characterization and Electrochemical Properties of RuO2 Thin Film Electrodes Prepared by Reactive Radio-Frequency Magnetron Sputtering

Published:2004-02-11 Issue:5 Volume:16 Page:946-952
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Battaglin G.¹,Rigato V.¹,Zandolin S.¹,Benedetti A.¹,Ferro S.¹,Nanni L.¹,De Battisti A.¹

Affiliation:

1. I.N.F.M., Dipartimento di Chimica Fisica dell'Università, Calle Larga S. Marta 2137, 30123 Venezia, Italy, I.N.F.M., Dipartimento di Fisica dell'Università, via Marzolo 8, 35131 Padova and I.N.F.N., Laboratori Nazionali di Legnaro, via Romea 4, 35020 Legnaro, Italy, Dipartimento di Chimica Fisica dell'Università, Calle Larga S. Marta 2137, 30123 Venezia, Italy, and Dipartimento di Chimica dell'Università, via L. Borsari 46, 44100 Ferrara, Italy

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm034610k

Reference44 articles.

1. Trasatti, S.; Lodi, G. InElectrodes of Conductive Metallic Oxides, PartA; Trasatti, S., Ed.; Elsevier: Amsterdam, 1980; pp 301−358.

2. Trasatti, S.; Lodi, G. InElectrodes of Conductive Metallic Oxides, PartB; Trasatti, S., Ed.; Elsevier: Amsterdam, 1981; pp 521−626.

3. Charactérisation des électrodes de type DSA pour le dégagement de O2—I. L'électrode Ti/IrO2Ta2O5

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