Adsorption of Cu, Pd, and Cs Atoms on Regular and Defect Sites of the SiO2 Surface-Reference-Cited by-同舟云学术

Adsorption of Cu, Pd, and Cs Atoms on Regular and Defect Sites of the SiO2 Surface

Published:1999-01-13 Issue:4 Volume:121 Page:813-821
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Lopez Nuria¹,Illas Francesc¹,Pacchioni Gianfranco¹

Affiliation:

1. Contribution from the Istituto Nazionale di Fisica della Materia, Dipartimento di Scienza dei Materiali, Università di Milano, via Emanueli, 15, 20126 Milano, Italy, and Departament de Quimica Fisica, Universitat de Barcelona, Marti i Franques 1, 08028 Barcelona, Spain

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja981753c

Reference53 articles.

1. The preparation of thin ordered transition metal oxide films on metal single crystals for surface science studies

2. Lambert, R. M., Pacchioni, G., Eds.Chemisorption and Reactivity onSupported Clusters and Thin Films; NATO ASI Series E, Vol. 331; Kluwer: Dordrecht, The Netherlands, 1997; p 353.

3. Alumina and titania overlayers on rhodium: A comparison of the chemisorption catalytic properties

4. Control of Dispersion of Ni2+ Ions via Chelate Ligands in the Preparation of Ni/SiO2 Materials. A XAFS Study

5. Rösch, N.; Pacchioni, G. In ref 2, p 353.

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