Chemical Approach to High-Resolution Patterning on Self-Assembled Monolayers Using Atomic Force Microscope Lithography-Reference-Cited by-同舟云学术

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Chemical Approach to High-Resolution Patterning on Self-Assembled Monolayers Using Atomic Force Microscope Lithography

Published:2002-10-01 Issue:22 Volume:18 Page:8375-8380
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Lee Wonbae¹,Kim Eung Ryul¹,Lee Haiwon¹

Affiliation:

1. Department of Chemistry, Hanyang University, Seoul 133-791, Korea

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la0115076

Reference34 articles.

1. "Dip-Pen" Nanolithography

2. Multiple Ink Nanolithography: Toward a Multiple-Pen Nano-Plotter

3. Fabrication of Nanometer Scale Patterns within Self-Assembled Monolayers by Nanografting

4. Fabrication and Imaging of Nanometer-Sized Protein Patterns

5. Patterning Surfaces Using Tip-Directed Displacement and Self-Assembly

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1. Soft-Lithographic Patterning of Luminescent Carbon Nanodots Derived from Collagen Waste;ACS Applied Materials & Interfaces;2018-10-01

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3. Epitaxial patterning of thin-films: conventional lithographies and beyond;Journal of Micromechanics and Microengineering;2014-07-31

4. AFM: Nanolithography on Organized Films;Dekker Encyclopedia of Nanoscience and Nanotechnology, Third Edition;2014-06-10

5. Surface Structure, Adsorption, and Thermal Desorption Behaviors of Methaneselenolate Monolayers on Au(111) from Dimethyl Diselenides;The Journal of Physical Chemistry C;2014-04-11

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