Preparation of Nitrogen-Substituted TiO2 Thin Film Photocatalysts by the Radio Frequency Magnetron Sputtering Deposition Method and Their Photocatalytic Reactivity under Visible Light Irradiation-Reference-Cited by-同舟云学术

Preparation of Nitrogen-Substituted TiO2 Thin Film Photocatalysts by the Radio Frequency Magnetron Sputtering Deposition Method and Their Photocatalytic Reactivity under Visible Light Irradiation

Published:2006-11-04 Issue:50 Volume:110 Page:25266-25272
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Kitano Masaaki¹,Funatsu Keisho¹,Matsuoka Masaya¹,Ueshima Michio¹,Anpo Masakazu¹

Affiliation:

1. Industry−University Cooperation Organization, Osaka Prefecture University, 1-2 Gakuen-cho, Naka-ku, Sakai, Osaka 599-8570, Japan, and Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai, Osaka 599-8531, Japan.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp064893e

Reference42 articles.

1. Environmental Applications of Semiconductor Photocatalysis

2. THE PREPARATION AND CHARACTERIZATION OF HIGHLY EFFICIENT TITANIUM OXIDE–BASED PHOTOFUNCTIONAL MATERIALS

3. A low-cost, high-efficiency solar cell based on dye-sensitized colloidal TiO2 films

4. Photooxidative self-cleaning transparent titanium dioxide films on glass

5. Light-induced amphiphilic surfaces

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