Effects of Annealing and Doping on Nanostructured Bismuth Telluride Thick Films-Reference-Cited by-同舟云学术

Effects of Annealing and Doping on Nanostructured Bismuth Telluride Thick Films

Published:2008-06-11 Issue:13 Volume:20 Page:4403-4410
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Li Shanghua¹,Soliman Hesham M. A.¹,Zhou Jian¹,Toprak Muhammet S.¹,Muhammed Mamoun¹,Platzek Dieter¹,Ziolkowski Pawel¹,Müller Eckhard¹

Affiliation:

1. Department of Microelectronics and Applied Physics, Royal Institute of Technology (KTH), Department of Microelectronics and Applied Physics, SE-16440 Stockholm, Sweden and German Aerospace Center (DLR), Institute of Materials Research, D-51170 Cologne, Germany

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm800696h

Reference31 articles.

1. Optimization of Bi2Te3 thin films for microintegrated Peltier heat pumps

2. Cooling performance of integrated thermoelectric microcooler

3. Fabrication of Nanostructured Thermoelectric Bismuth Telluride Thick Films by Electrochemical Deposition

4. Fleurial, J. P. Snyder, G. J. Patel, J. Herman, J. A. Giauque, P. H. Phillips, W. M. Ryan, M. A. Shakkottai, P. Kolawa, E. A. Nicolet, M. A.Proceedings of the 18th International Conference on Thermoelectrics, Baltimore, MD, Aug 29–Sept 2,1999; IEEE Cat. No. 99TH8407: Piscataway, NJ, 1999, p294.

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