Fabrication of Arrays of Sub-20-nm Silica Walls via Photolithography and Solution-Based Molecular Coating
Author:
Affiliation:
1. Topochemical Design Laboratory, Innovative Nanopatterning Laboratory, RIKEN, Wako, Saitama 351-0198, Japan
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la061830e
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1. "Dip-Pen" Nanolithography
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