Nanoscopic Cylindrical Dual Concentric and Lengthwise Block Brush Terpolymers as Covalent Preassembled High-Resolution and High-Sensitivity Negative-Tone Photoresist Materials-Reference-Cited by-同舟云学术

Nanoscopic Cylindrical Dual Concentric and Lengthwise Block Brush Terpolymers as Covalent Preassembled High-Resolution and High-Sensitivity Negative-Tone Photoresist Materials

Published:2013-03-12 Issue:11 Volume:135 Page:4203-4206
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Sun Guorong,Cho Sangho,Clark Corrie,Verkhoturov Stanislav V.,Eller Michael J.,Li Ang,Pavía-Jiménez Adriana,Schweikert Emile A.,Thackeray James W.¹,Trefonas Peter¹,Wooley Karen L.

Affiliation:

1. Dow Electronic Materials, Marlborough, Massachusetts 01752, United States

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja3126382

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