pH-Sensitive Thin Hydrogel Microfabricated by Photolithography
Author:
Affiliation:
1. Graduate School of Materials Science, NAIST, Ikoma 630-0101, Japan, and PRESTO, Japan Science and Technology Corporation, Keihanna Plaza, Hikaridai 1-7, Seika-cho, Kyoto 619-0237, Japan
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la9806303
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