Growth and Structure of Water on SiO2 Films on Si Investigated by Kelvin Probe Microscopy and in Situ X-ray Spectroscopies-Reference-Cited by-同舟云学术

Growth and Structure of Water on SiO2 Films on Si Investigated by Kelvin Probe Microscopy and in Situ X-ray Spectroscopies

Published:2007-08-16 Issue:19 Volume:23 Page:9699-9703
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Verdaguer Albert¹,Weis Christoph¹,Oncins Gerard¹,Ketteler Guido¹,Bluhm Hendrik¹,Salmeron Miquel¹

Affiliation:

1. Materials Sciences Division and Chemical Sciences Division, Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720, Institut Català de Nanotecnologia (ICN), Campus de Bellaterra-Facultat de Ciències, Edifici C-Ala Nord-Mòduls, 08193 Bellaterra, Spain, and Department of Physical Chemistry, Universitat de Barcelona, 08028 Barcelona, Spain

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la700893w

Reference33 articles.

1. The interaction of water with solid surfaces: Fundamental aspects

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3. Thin Film Water

4. Verdaguer, A.; Sacha, G. M.; Bluhm, H.; Salmeron, M.Chem. Rev.2006.

5. Oxide surfaces as environmental interfaces

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