Exploiting Substrate Stress To Modify Nanoscale SAM Patterns-Reference-Cited by-同舟云学术

Exploiting Substrate Stress To Modify Nanoscale SAM Patterns

Published:2009-10-26 Issue:45 Volume:131 Page:16377-16379
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Singh Chetana¹,Jackson Alicia M.¹,Stellacci Francesco¹,Glotzer Sharon C.¹

Affiliation:

1. Department of Chemical Engineering, University of Michigan, Ann Arbor, Michigan 48109, Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, and Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja9063876

Reference22 articles.

1. Self-Assembled Monolayers of Thiolates on Metals as a Form of Nanotechnology

2. Phase behavior of two-component self-assembled monolayers of alkanethiolates on gold

3. The role of nanostructure in the wetting behavior of mixed-monolayer-protected metal nanoparticles

4. Nanometer-scale phase separation in mixed composition self-assembled monolayers

5. Effect of Substrate Strain on Adsorption

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