Photolysis of CF3CH2CHO in the Presence of O2 at 248 and 266 nm: Quantum Yields, Products, and Mechanism-Reference-Cited by-同舟云学术

Photolysis of CF3CH2CHO in the Presence of O2 at 248 and 266 nm: Quantum Yields, Products, and Mechanism

Published:2013-10-03 Issue:41 Volume:117 Page:10661-10670
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Antiñolo M.¹,Bettinelli C.²³,Jain C.³,Dréan P.²,Lemoine B.²,Albaladejo J.¹,Jiménez E.¹,Fittschen C.³

Affiliation:

1. Departamento de Química Física, Facultad de Ciencias y Tecnologías Químicas, Universidad de Castilla-La Mancha, Avda. Camilo José Cela, s/n. 13071 Ciudad Real, Spain

2. Laboratoire PhLAM - UMR CNRS 8523, Université Lille Nord de France, Cité Scientifique, 59655 Villeneuve d’Ascq, France

3. Laboratoire PC2A - UMR CNRS 8522, Université Lille Nord de France, Cité Scientifique, 59655 Villeneuve d’Ascq, France

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp404823b

Reference33 articles.

1. A Kinetic and Mechanistic Study of the Reactions of OH Radicals and Cl Atoms with 3,3,3-Trifluoropropanol under Atmospheric Conditions

2. Atmospheric Chemistry of Perfluoroaldehydes (CxF2x+1CHO) and Fluorotelomer Aldehydes (CxF2x+1CH2CHO): Quantification of the Important Role of Photolysis

3. UV absorption cross sections between 230 and 350 nm and pressure dependence of the photolysis quantum yield at 308 nm of CF3CH2CHO

4. Photochemistry of CF3(CH2)2CHO in air: UV absorption cross sections between 230 and 340 nm and photolysis quantum yields at 308 nm

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2. Ionic Fragmentation Mechanisms of 2,2,2-Trifluoroethanol Following Excitation with Synchrotron Radiation;ChemPhysChem;2014-12-05

3. Photolysis of CH3CHO at 248 nm: Evidence of triple fragmentation from primary quantum yield of CH3 and HCO radicals and H atoms;The Journal of Chemical Physics;2014-06-07