Huge Photoresistance in Transparent and Conductive Indium Titanium Oxide Films Prepared by Electron Beam–Physical Vapor Deposition-Reference-Cited by-同舟云学术

Huge Photoresistance in Transparent and Conductive Indium Titanium Oxide Films Prepared by Electron Beam–Physical Vapor Deposition

Author:

Martínez-Morillas Rocío¹,Ramírez Rafael²,Sánchez-Marcos Jorge¹³,Fonda Emiliano⁴,de Andrés Alicia¹,Prieto Carlos¹

Affiliation:

1. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Cantoblanco, 28049 Madrid, Spain

2. Departamento de Física, Escuela Politécnica Superior, Universidad Carlos III de Madrid, Avenida Universidad 30, Leganés, 28911 Madrid, Spain

3. Departamento de Química-Física Aplicada, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid, Spain

4. Synchrotron SOLEIL, F-91192 Gif Sur Yvette, France

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

Reference50 articles.

1. Hartnagel, H. L.; Dawar, A. L.; Jain, A. K.; Jadadish, C.Semiconducting Transparent Thin Films;Institute of Physics:Bristol, U.K., 1995; pp1–358.

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