Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography-Reference-Cited by-同舟云学术

Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography

Published:2019-08-19 Issue:9 Volume:19 Page:6043-6048
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Lewis Scott M.¹²^ORCID,Hunt Matthew S.²,DeRose Guy A.²,Alty Hayden R.¹,Li Jarvis²,Wertheim Alex²,De Rose Lucia²,Timco Grigore A.¹,Scherer Axel²,Yeates Stephen G.¹,Winpenny Richard E. P.¹^ORCID

Affiliation:

1. School of Chemistry and Photon Science Institute, The University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom

2. Department of Applied Physics and Materials Science and the Kavli Nanoscience Institute, California Institute of Technology, 1200 East California Boulevard, MC 107-81, Pasadena, California 91125, United States

Funder

Engineering and Physical Sciences Research Council

University of Manchester

Kavli Nanoscience Institute, Caltech

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.9b01911

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