Through-Thickness Vertically Ordered Lamellar Block Copolymer Thin Films on Unmodified Quartz with Cold Zone Annealing-Reference-Cited by-同舟云学术

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Through-Thickness Vertically Ordered Lamellar Block Copolymer Thin Films on Unmodified Quartz with Cold Zone Annealing

Published:2017-11-21 Issue:12 Volume:17 Page:7814-7823
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Basutkar Monali N.¹^ORCID,Samant Saumil¹^ORCID,Strzalka Joseph²,Yager Kevin G.³^ORCID,Singh Gurpreet¹,Karim Alamgir¹^ORCID

Affiliation:

1. Department of Polymer Engineering, University of Akron, Akron, Ohio 44325, United States

2. X-Ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States

3. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States

Funder

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.7b04028

Reference75 articles.

1. Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes

2. Block copolymer patterns and templates

3. Block copolymers and conventional lithography

4. Directed Self-Assembly of Block Copolymers for High Breakdown Strength Polymer Film Capacitors

5. Block Copolymer Thin Films: Physics and Applications

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